Collaboration Among Trumpf, Zeiss, Fraunhofer Yields Federal Prize

OBERKOCHEN, Germany, Nov. 27, 2020 — Trumpf, Zeiss, and the Fraunhofer Institute for Applied Optics and Precision Mechanics were awarded the Deutscher Zukunftspreis 2020 (German Future Prize 2020) for their project “EUV Lithography: New Light for the Digital Age.”

The research effort drew on the respective expertise of experts from each institution, yielding a process based on extreme-UV (EUV), which allows for the energy-efficient and cost-effective fabrication of microchips. The award granted the companies €250,000, which Trumpf and Zeiss will be donating to charity. President of Germany presented the award Nov. 25 in Berlin under pandemic restrictions in the Verti Music Hall.

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